SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Optical Microlithography XXX - Addressing optical proximity correction challenges from highly nonlinear models
Erdmann, Andreas, Kye, Jongwook, Jang, Stephen, Zhang, Yunqiang, Cecil, Tom, Cai, Howard, Poonawala, Amyn, St. John, MattVolume:
10147
Year:
2017
Language:
english
DOI:
10.1117/12.2258088
File:
PDF, 437 KB
english, 2017