The removal of metal impurities from the surface of Czochralski wafers using a porous silicon-based gettering under a gas flow HCl/O 2 dry
Zarroug, Ahmed, Hamed, Zied Ben, Laatar, Fakher, Derbali, Lotfi, Ezzaouia, HatemVolume:
91
Language:
english
Journal:
Materials Research Bulletin
DOI:
10.1016/j.materresbull.2017.03.038
Date:
July, 2017
File:
PDF, 356 KB
english, 2017