Focused ion beam implantation for the nucleation of...

Microelectronic Engineering 2017 / 06 Vol. 177

Focused ion beam implantation for the nucleation of self-catalyzed III-V nanowires

Lancaster, Suzanne, Kriz, Martin, Schinnerl, Markus, MacFarland, Donald, Zederbauer, Tobias, Andrews, Aaron Maxwell, Schrenk, Werner, Strasser, Gottfried, Detz, Hermann
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Volume:
177
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2017.03.003
Date:
June, 2017
File:
PDF, 1.26 MB
english, 2017
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