[IEEE 2016 21st International Conference on Ion Implantation Technology (IIT) - Tainan, Taiwan (2016.9.26-2016.9.30)] 2016 21st International Conference on Ion Implantation Technology (IIT) - A Hybrid Implant Doping Technique with Plasma Immersion Ion Implant (PIII) Process for 10 nm Fin Cannel of 3D-FET

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