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[IEEE 2016 21st International Conference on Ion Implantation Technology (IIT) - Tainan, Taiwan (2016.9.26-2016.9.30)] 2016 21st International Conference on Ion Implantation Technology (IIT) - Effect of Ion Flux in Source-Drain Extension Ion Implantation for 10-nm Node FinFet and beyond on 300/450mm Platforms
Shen, Ming-Yi, Basavalingappa, Adarsh, Hayakawa, Takeshi, Matsugi, Hidekazu, Borst, Christopher, Chang, StockYear:
2016
Language:
english
DOI:
10.1109/IIT.2016.7882867
File:
PDF, 1.07 MB
english, 2016