[IEEE 2016 21st International Conference on Ion Implantation Technology (IIT) - Tainan, Taiwan (2016.9.26-2016.9.30)] 2016 21st International Conference on Ion Implantation Technology (IIT) - Intentional Two-Dimensional Non-Uniform Dose Implant with High Dynamic Dose Range
Ishibashi, Kazuhisa, Ninomiya, Shiro, Yumiyama, Toshio, Ochi, Akihiro, Funai, Akira, Kabasawa, Mitsuaki, Tsukihara, Mitsukuni, Ueno, KazuyoshiYear:
2016
Language:
english
DOI:
10.1109/IIT.2016.7882883
File:
PDF, 533 KB
english, 2016