[IEEE 2016 21st International Conference on Ion Implantation Technology (IIT) - Tainan, Taiwan (2016.9.26-2016.9.30)] 2016 21st International Conference on Ion Implantation Technology (IIT) - Process Robustness against Photoresist Outgassing in Single-Wafer High-Energy Implanters
Kariya, Hiroyuki, Kawasaki, Yoji, Sasaki, Haruka, Sato, Fumiaki, Watanabe, Kazuhiro, Sugitani, MichiroYear:
2016
Language:
english
DOI:
10.1109/IIT.2016.7882904
File:
PDF, 446 KB
english, 2016