Performance Improvement of HfS2 Transistors by Atomic Layer...

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IEEE Transactions on Nanotechnology 2017

Performance Improvement of HfS2 Transistors by Atomic Layer Deposition of HfO2

Kanazawa, Toru, Amemiya, Tomohiro, Upadhyaya, Vikrant, Ishikawa, Atsushi, Tsuruta, Kenji, Tanaka, Takuo, Miyamoto, Yasuyuki
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Year:
2017
Language:
english
Journal:
IEEE Transactions on Nanotechnology
DOI:
10.1109/TNANO.2017.2661403
File:
PDF, 465 KB
english, 2017
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