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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Optical Microlithography XXX - Lithography and OPC friendly triple patterning decomposition method for VIA
Erdmann, Andreas, Kye, Jongwook, Yan, Guanyong, Li, Liang, Chen, Xiao, Liu, Qingwei, Tu, YuanyingVolume:
10147
Year:
2017
Language:
english
DOI:
10.1117/12.2257922
File:
PDF, 440 KB
english, 2017