A high-speed photoresist removal process using multibubble microwave plasma under a mixture of multiphase plasma environment
Ishijima, Tatsuo, Nosaka, Kohei, Tanaka, Yasunori, Uesugi, Yoshihiko, Goto, Yousuke, Horibe, HideoVolume:
103
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.4823530
Date:
September, 2013
File:
PDF, 1.15 MB
english, 2013