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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Extreme Ultraviolet (EUV) Lithography VIII - Absorption and exposure kinetics of photoresists at EUV
Panning, Eric M., Goldberg, Kenneth A., Fallica, Roberto, Haitjema, Jarich, Wu, Lianjia, Castellanos, Sonia, Brouwer, Fred, Ekinci, YasinVolume:
10143
Year:
2017
Language:
english
DOI:
10.1117/12.2257240
File:
PDF, 703 KB
english, 2017