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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Advances in Patterning Materials and Processes XXXIV - Difference in EUV photoresist design towards reduction of LWR and LCDU
Hohle, Christoph K., Gronheid, Roel, Jiang, Jing, De Simone, Danilo, Vandenberghe, GeertVolume:
10146
Year:
2017
Language:
english
DOI:
10.1117/12.2257899
File:
PDF, 1.28 MB
english, 2017