Lattice location of implanted Co in heavily doped\(n^+\)-...

Applied Physics A: Materials Science & Processing 2017 / 4 Vol. 123; Iss. 4

Lattice location of implanted Co in heavily doped\(n^+\)- and\(p^+\)-type silicon

Silva, Daniel José da, Wahl, Ulrich, Correia, João Guilherme, Amorim, Lígia Marina, Silva, Manuel Ribeiro da, Pereira, Lino Miguel da Costa, Araújo, João Pedro
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Volume:
123
Language:
english
Journal:
Applied Physics A
DOI:
10.1007/s00339-017-0870-0
Date:
April, 2017
File:
PDF, 2.22 MB
english, 2017
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