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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Metrology, Inspection, and Process Control for Microlithography XXXI - A new method for wafer quality monitoring using semiconductor process big data
Sanchez, Martha I., Ukraintsev, Vladimir A., Sohn, Younghoon, Lee, Hyun, Yang, Yusin, Jun, ChungsamVolume:
10145
Year:
2017
Language:
english
DOI:
10.1117/12.2256435
File:
PDF, 4.41 MB
english, 2017