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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Metrology, Inspection, and Process Control for Microlithography XXXI - Combined process window monitoring for critical features
Sanchez, Martha I., Ukraintsev, Vladimir A., Hartig, Carsten, Schulz, Bernd, Melzer, Robert, Ruhm, Matthias, Fischer, Daniel, Buhl, Stefan, Habets, Boris, Rößiger, Martin, Gutsch, ManuelaVolume:
10145
Year:
2017
Language:
english
DOI:
10.1117/12.2259910
File:
PDF, 1.53 MB
english, 2017