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[WORLD SCIENTIFIC 2016 International Conference on Advanced Materials, Technology and Application (AMTA2016) - Changsha, China (18 – 20 March 2016)] Advanced Materials, Technology and Application - Effect of negative bias on photoelectric properties of NiO thin films prepared by magnetron sputtering
Xiao, Zong-Hu, Xu, Shun-Jian, Luo, Yong-Ping, Zhong, Wei, Ou, Hui, Wu, Huan-Wen, Jiang, Er-ShuaiLanguage:
english
DOI:
10.1142/9789813200470_0052
File:
PDF, 3.28 MB
english