Analysis of Stochastic Effect in Line-and-Space Resist...

Applied Physics Express 2013 / 02 Vol. 6; Iss. 2

Analysis of Stochastic Effect in Line-and-Space Resist Patterns Fabricated by Extreme Ultraviolet Lithography

Kozawa, Takahiro, Santillan, Julius Joseph, Itani, Toshiro
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
6
Language:
english
Journal:
Applied Physics Express
DOI:
10.7567/APEX.6.026502
Date:
February, 2013
File:
PDF, 1.08 MB
english, 2013
Conversion to is in progress
Conversion to is failed