SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Emerging Patterning Technologies - Improved defectivity and particle control for nanoimprint lithography high-volume semiconductor manufacturing
Bencher, Christopher, Cheng, Joy Y., Nakayama, Takahiro, Yonekawa, Masami, Matsuoka, Yoichi, Azuma, Hisanobu, Takabayashi, Yukio, Aghili, Ali, Mizuno, Makoto, Choi, Jin, Jones, Chris E.Volume:
10144
Year:
2017
Language:
english
DOI:
10.1117/12.2257647
File:
PDF, 5.82 MB
english, 2017