SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Advances in Patterning Materials and Processes XXXIV - DSA process window expansion with novel DSA track hardware
Hohle, Christoph K., Gronheid, Roel, Harumoto, Masahiko, Stokes, Harold, Tanaka, Yuji, Kaneyama, Koji, Pieczulewski, Chalres, Asai, Masaya, Argoud, Maxime, Servin, Isabelle, Chamiot-Maitral, Gaëlle, CVolume:
10146
Year:
2017
Language:
english
DOI:
10.1117/12.2257945
File:
PDF, 3.01 MB
english, 2017