SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Emerging Patterning Technologies - Study of nanoimprint lithography (NIL) for HVM of memory devices
Bencher, Christopher, Cheng, Joy Y., Kono, Takuya, Hatano, Masayuki, Tokue, Hiroshi, Kobayashi, Kei, Suzuki, Masato, Fukuhara, Kazuya, Asano, Masafumi, Nakasugi, Tetsuro, Choi, Eun Hyuk, Jung, WooyungVolume:
10144
Year:
2017
Language:
english
DOI:
10.1117/12.2257951
File:
PDF, 532 KB
english, 2017