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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Advances in Patterning Materials and Processes XXXIV - Lamellar orientation of block copolymer using polarity switch of nitrophenyl self-assembled monolayer induced by electron beam
Hohle, Christoph K., Gronheid, Roel, Yamamoto, Hiroki, Dawson, Guy, Kozawa, Takahiro, Robinson, Alex P. G.Volume:
10146
Year:
2017
Language:
english
DOI:
10.1117/12.2257953
File:
PDF, 334 KB
english, 2017