SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Emerging Patterning Technologies - Wide-range directed self-assembly lithography enabling wider range of applicable pattern size for both hexagonal multi-hole and line/space
Bencher, Christopher, Cheng, Joy Y., Morita, Seiji, Saito, Ryuichi, Yamamoto, Ryosuke, Sasao, Norikatsu, Sawabe, Tomoaki, Asakawa, Koji, Sugimura, ShinobuVolume:
10144
Year:
2017
Language:
english
DOI:
10.1117/12.2257987
File:
PDF, 1.66 MB
english, 2017