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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Advances in Patterning Materials and Processes XXXIV - Orientation control of silicon containing block-co-polymer with resolution beyond 10nm
Hohle, Christoph K., Gronheid, Roel, Someya, Yasunobu, Mizuochi, Ryuta, Wakayama, Hiroyuki, Tadokoro, Shinsuke, Kozawa, Masami, Sakamoto, RikimaruVolume:
10146
Year:
2017
Language:
english
DOI:
10.1117/12.2258145
File:
PDF, 1.58 MB
english, 2017