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Enhanced dielectric deposition on single-layer MoS 2 with low damage using remote N 2 plasma treatment
Qian, Qingkai, Zhang, Zhaofu, Hua, Mengyuan, Tang, Gaofei, Lei, Jiacheng, Lan, Feifei, Xu, Yongkuan, Yan, Ruyue, Chen, Kevin JVolume:
28
Language:
english
Journal:
Nanotechnology
DOI:
10.1088/1361-6528/aa6756
Date:
April, 2017
File:
PDF, 2.86 MB
english, 2017