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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Metrology, Inspection, and Process Control for Microlithography XXXI - Robust 2D patterns process variability assessment using CD-SEM contour extraction offline metrology
Sanchez, Martha I., Ukraintsev, Vladimir A., Lakcher, Amine, Le-Gratiet, Bertrand, Ducoté, Julien, Fanton, Pierre, Kiers, Ton, Gemmink, Jan-Willem, Hunsche, Stefan, Prentice, Christopher, Besacier, MaVolume:
10145
Year:
2017
Language:
english
DOI:
10.1117/12.2257876
File:
PDF, 7.11 MB
english, 2017