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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Advances in Patterning Materials and Processes XXXIV - Fundamentals of EUV resist-inorganic hardmask interactions
Hohle, Christoph K., Gronheid, Roel, Goldfarb, Dario L., Glodde, Martin, De Silva, Anuja, Sheshadri, Indira, Felix, Nelson M., Lionti, Krystelle, Magbitang, TeddieVolume:
10146
Year:
2017
Language:
english
DOI:
10.1117/12.2257933
File:
PDF, 892 KB
english, 2017