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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Advanced Etch Technology for Nanopatterning VI - Silicon photonics and challenges for fabrication
Engelmann, Sebastian U., Wise, Rich S., Feilchenfeld, N. B., Nummy, K., Barwicz, T., Gill, D., Kiewra, E., Leidy, R., Orcutt, J. S., Rosenberg, J., Stricker, A. D., Whiting, C., Ayala, J., Cucci, B.,Volume:
10149
Year:
2017
Language:
english
DOI:
10.1117/12.2263472
File:
PDF, 3.28 MB
english, 2017