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SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - Model study by FT-IR of the interaction of select cholate dissolution inhibitors with poly(norbornene-alt-maleic anhydride) and its derivatives
Dabbagh, Gary, Conley, Will, Houlihan, Francis M., Rushkin, Ilya, Hutton, Richard S., Nalamasu, Omkaram, Reichmanis, Elsa, Gabor, Allen H., Medina, Arturo N.Volume:
3678
Year:
1999
Language:
english
DOI:
10.1117/12.350155
File:
PDF, 420 KB
english, 1999