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Formation of alpha and beta tantalum at the variation of magnetron sputtering conditions
Nasakina, E O, Sevostyanov, M A, Mikhaylova, A B, Baikin, A S, Sergienko, K V, Leonov, A V, Kolmakov, A GVolume:
110
Language:
english
Journal:
IOP Conference Series: Materials Science and Engineering
DOI:
10.1088/1757-899X/110/1/012042
Date:
February, 2016
File:
PDF, 893 KB
english, 2016