Microstructure studies of interdiffusion behavior of U 3 Si...

Journal of Nuclear Materials 2017 / 04 Vol. 486

Microstructure studies of interdiffusion behavior of U 3 Si 2 /Zircaloy-4 at 800 and 1000 °C

He, Lingfeng, Harp, Jason M., Hoggan, Rita E., Wagner, Adrian R.
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Volume:
486
Language:
english
Journal:
Journal of Nuclear Materials
DOI:
10.1016/j.jnucmat.2017.01.035
Date:
April, 2017
File:
PDF, 3.97 MB
english, 2017
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