The influence of annealing on yttrium oxide thin film...

Nuclear Materials and Energy 2017 / 01 Vol. 10

The influence of annealing on yttrium oxide thin film deposited by reactive magnetron sputtering: Process and microstructure

Mao, Y., Engels, J., Houben, A., Rasinski, M., Steffens, J., Terra, A., Linsmeier, Ch., Coenen, J.W.
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Volume:
10
Language:
english
Journal:
Nuclear Materials and Energy
DOI:
10.1016/j.nme.2016.12.031
Date:
January, 2017
File:
PDF, 3.28 MB
english, 2017
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