Influence of plasma-based in-situ surface cleaning procedures on HfO 2 /In 0.53 Ga 0.47 As gate stack properties
Chobpattana, Varistha, Mates, Thomas E., Mitchell, William J., Zhang, Jack Y., Stemmer, SusanneVolume:
114
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.4825259
Date:
October, 2013
File:
PDF, 1.13 MB
english, 2013