Control of Sidewall Profile in Dry Plasma Etching of...

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Journal of Microelectromechanical Systems 2017

Control of Sidewall Profile in Dry Plasma Etching of Polyimide

Zawierta, Michal, Martyniuk, Mariusz, Jeffery, Roger D., Putrino, Gino, Keating, Adrian, Silva, K. K. M. B. Dilusha, Faraone, Lorenzo
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Year:
2017
Language:
english
Journal:
Journal of Microelectromechanical Systems
DOI:
10.1109/JMEMS.2017.2681106
File:
PDF, 4.91 MB
english, 2017
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