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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Extreme Ultraviolet (EUV) Lithography VIII - Exploring the readiness of EUV photo materials for patterning advanced technology nodes
Panning, Eric M., Goldberg, Kenneth A., De Simone, Danilo, Vesters, Yannick, Shehzad, Atif, Vandenberghe, Geert, Foubert, Philippe, Beral, Christophe, Van den Heuvel, Dieter, Mao, Ming, Lazzarino, FreVolume:
10143
Year:
2017
Language:
english
DOI:
10.1117/12.2258220
File:
PDF, 2.70 MB
english, 2017