SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - EUV resist based on low molecular weight PHS
Henderson, Clifford L., Shirai, Masamitsu, Kurosima, Akitaka, Okamura, Haruyuki, Kaneyama, Koji, Itani, ToshiroVolume:
6923
Year:
2008
Language:
english
DOI:
10.1117/12.771774
File:
PDF, 222 KB
english, 2008