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FT-IR-ATR observation of SiOH and SiH in the oxide layer on an Si wafer
Yoshikatsu Nagasawa, Hideyuki Ishida, Fusami Soeda, Akira Ishitani, Ichiro Yoshii, Kazuhiko YamamotoVolume:
94
Year:
1988
Language:
english
Pages:
4
DOI:
10.1007/bf01205923
File:
PDF, 164 KB
english, 1988