Microstructure developments and anti-reflection properties...

Materials Science in Semiconductor Processing 2017 / 06 Vol. 63

Microstructure developments and anti-reflection properties of SiO 2 films by liquid-phase deposition

He, Jing, Ke, Yangchuan
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Volume:
63
Language:
english
Journal:
Materials Science in Semiconductor Processing
DOI:
10.1016/j.mssp.2017.02.008
Date:
June, 2017
File:
PDF, 2.53 MB
english, 2017
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