SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Extreme Ultraviolet (EUV) Lithography VIII - 2D self-aligned via patterning strategy with EUV single-exposure in 3nm technology
Panning, Eric M., Goldberg, Kenneth A., Choi, Suhyeong, Lee, Jae Uk, Blanco Carballo, Victor M., Kim, Ryoung-Han, Shin, YoungsooVolume:
10143
Year:
2017
Language:
english
DOI:
10.1117/12.2257923
File:
PDF, 920 KB
english, 2017