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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Optical Microlithography XXX - Compact modeling for the negative tone development processes
Erdmann, Andreas, Kye, Jongwook, Kuo, Fred, Huang, Jason, Melvin, Lawrence S.Volume:
10147
Year:
2017
Language:
english
DOI:
10.1117/12.2258057
File:
PDF, 414 KB
english, 2017