SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Metrology, Inspection, and Process Control for Microlithography XXXI - High-throughput electrical characterization for robust overlay lithography control
Sanchez, Martha I., Ukraintsev, Vladimir A., Shen, Xumin, Duggan, Mark, Singh, Sunil, Rullan, Jonathan, Choo, Jae, Mehta, Sohan, Tang, Teck Jung, Reidy, Sean, Holt, Jonathan, Kim, Hyung Woo, Fox, RobeVolume:
10145
Year:
2017
Language:
english
DOI:
10.1117/12.2260707
File:
PDF, 5.89 MB
english, 2017