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Control of Beam Energy and Flux Ratio in an Ion-Beam-Background Plasma System Produced in a Double Plasma Device
Wei, Zian, Ma, Jinxiu, Li, Yuanrui, Sun, Yan, Jiang, ZhengqiVolume:
18
Language:
english
Journal:
Plasma Science and Technology
DOI:
10.1088/1009-0630/18/11/04
Date:
November, 2016
File:
PDF, 578 KB
english, 2016