Plasma-assisted atomic layer epitaxial growth of aluminum...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2017 / 05 Vol. 35; Iss. 3

Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering

Anderson, Virginia R., Nepal, Neeraj, Johnson, Scooter D., Robinson, Zachary R., Nath, Anindya, Kozen, Alexander C., Qadri, Syed B., DeMasi, Alexander, Hite, Jennifer K., Ludwig, Karl F., Eddy, Charle
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Volume:
35
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4979007
Date:
May, 2017
File:
PDF, 1.77 MB
english, 2017
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