SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Extreme Ultraviolet (EUV) Lithography VIII - Influence of post exposure bake time on EUV photoresist RLS trade-off
Panning, Eric M., Goldberg, Kenneth A., Vesters, Yannick, De Simone, Danilo, De Gendt, StefanVolume:
10143
Year:
2017
Language:
english
DOI:
10.1117/12.2257910
File:
PDF, 780 KB
english, 2017