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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Extreme Ultraviolet (EUV) Lithography VIII - Enabling sub-10nm node lithography: presenting the NXE:3400B EUV scanner with improved overlay, imaging, and throughput
Panning, Eric M., Goldberg, Kenneth A., van de Kerkhof, Mark, Jasper, Hans, Levasier, Leon, Peeters, Rudy, van Es, Roderik, Bosker, Jan-Willem, Zdravkov, Alexander, Lenderink, Egbert, Evangelista, FabVolume:
10143
Year:
2017
Language:
english
DOI:
10.1117/12.2258025
File:
PDF, 1.65 MB
english, 2017