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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Advances in Patterning Materials and Processes XXXIV - Chemical changes in hybrid photoresists before and after exposure by in situ NEXAFS analysis
Hohle, Christoph K., Gronheid, Roel, Fallica, Roberto, Watts, Benjamin, Della Giustina, Gioia, Brigo, Laura, Brusatin, Giovanna, Ekinci, YasinVolume:
10146
Year:
2017
Language:
english
DOI:
10.1117/12.2258215
File:
PDF, 628 KB
english, 2017