SPIE Proceedings [SPIE SPIE Advanced Lithography - San...

  • Main
  • SPIE Proceedings [SPIE SPIE Advanced...

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Design-Process-Technology Co-optimization for Manufacturability XI - A fuzzy pattern matching method based on graph kernel for lithography hotspot detection

Capodieci, Luigi, Cain, Jason P., Nitta, Izumi, Kanazawa, Yuzi, Ishida, Tsutomu, Banno, Koji
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
10148
Year:
2017
Language:
english
DOI:
10.1117/12.2257654
File:
PDF, 919 KB
english, 2017
Conversion to is in progress
Conversion to is failed