SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Design-Process-Technology Co-optimization for Manufacturability XI - A fuzzy pattern matching method based on graph kernel for lithography hotspot detection
Capodieci, Luigi, Cain, Jason P., Nitta, Izumi, Kanazawa, Yuzi, Ishida, Tsutomu, Banno, KojiVolume:
10148
Year:
2017
Language:
english
DOI:
10.1117/12.2257654
File:
PDF, 919 KB
english, 2017