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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Design-Process-Technology Co-optimization for Manufacturability XI - Systematic analysis of the timing and power impact of pure lines and cuts routing for multiple patterning
Capodieci, Luigi, Cain, Jason P., Vashishtha, Vinay, Masand, Lovish, Dosi, Ankita, Ramamurthy, Chandarasekaran, Clark, Lawrence T.Volume:
10148
Year:
2017
Language:
english
DOI:
10.1117/12.2258085
File:
PDF, 2.91 MB
english, 2017