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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Design-Process-Technology Co-optimization for Manufacturability XI - Enhancing manufacturability of standard cells by using DTCO methodology

Capodieci, Luigi, Cain, Jason P., Zhao, Lijun, Chen, Ying, Su, Xiaojing, Su, Yajuan, Wei, Yayi, Ye, Tianchun
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Volume:
10148
Year:
2017
Language:
english
DOI:
10.1117/12.2263178
File:
PDF, 1021 KB
english, 2017
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