Application of Diffusion from Implanted Polycrystalline...

Japanese Journal of Applied Physics 1976 / 01 Vol. 15; Iss. S1

Application of Diffusion from Implanted Polycrystalline Silicon to Bipolar Transistors

Akasaka, Youichi, Tsukamoto, Katsuhiro, Kawaguchi, Mikio, Sato, Hirokazu, Horie, Kazuo, Komiya, Hiroyoshi
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
15
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAPS.15S1.49
Date:
January, 1976
File:
PDF, 663 KB
english, 1976
Conversion to is in progress
Conversion to is failed