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Application of Diffusion from Implanted Polycrystalline Silicon to Bipolar Transistors
Akasaka, Youichi, Tsukamoto, Katsuhiro, Kawaguchi, Mikio, Sato, Hirokazu, Horie, Kazuo, Komiya, HiroyoshiVolume:
15
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAPS.15S1.49
Date:
January, 1976
File:
PDF, 663 KB
english, 1976