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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Optical Microlithography XXX - Development of the next-generation ArF excimer laser with ultra-narrow stable spectral bandwidth for multiple patterning immersion lithography
Erdmann, Andreas, Kye, Jongwook, Furusato, Hiroshi, Kumazaki, Takahito, Ohta, Takeshi, Tsushima, Hiroaki, Kurosu, Akihiko, Matsunaga, Takashi, Mizoguchi, HakaruVolume:
10147
Year:
2017
Language:
english
DOI:
10.1117/12.2257960
File:
PDF, 647 KB
english, 2017